Table Top Furnaces

For university or commercial product development, limited production, or R&D work large-scale batch furnaces are usually too costly in terms of budget, facilities requirements, and clean room space to be the best solution to your thermal processing or LPCVD system needs.

Expertech has designed a series of furnace systems to deliver the same performance, control, and process system capabilities as the larger machines but on a table top scale. Setup is easy and reduced power requirements enable most locations to add furnace capability without rewiring. The TT-Series furnaces are also available with a support cabinet, cantilever wafer loaders, and many other options.

The Expertech TT-Series furnaces support all atmospheric pressure and LPCVD processes. 
Model: TT150 Series TT200 Series TT300 Series
Substrate Sizes: 150mm 200mm 300mm
Temperature Range: 400-1250°C 400-1250°C 400-1250°C
Furnace Flatzone(inches): 12" 12" 12"
Number of Tubes/stack: 1 to 4 1 to 3 1 or 2
Process Control System Options:

Thermco TMX 9-12k
(Brooks) SEMY Mypro
ICCI
SLC99
ITS - Tymekon

 Thermco TMX 9-12k
(Brooks) SEMY Mypro
ICCI
SLC99
ITS - Tymekon		 Thermco TMX 9-12k
(Brooks) SEMY Mypro
ICCI
SLC99
ITS - Tymekon
Supervisory System Options:

Brooks
(SEMY)
JGA
ICCI
GMI-Host

 Brooks
(SEMY)
JGA
ICCI
GMI-Host		 Brooks
(SEMY)
JGA
ICCI
GMI-Host
Typical Atmospheric Processes Supported: Pyrogenic Oxidations (Internal/External Torch)
DI-H2O derived Oxidation (special hi-saturation, auto-fill, long cycle)
Diffusion
Dopant Processes (liquid and solid source)
Anneal (inert and reducing atmosphere)
Typical LPCVD Processes Supported: Poly-Silicon (lo-temp, amorphous, hi-temp H2, and doped)
Silicon Nitride (standard ratio and low-stress films)
LTO, PSG, BPSG
TEOS
Vacuum Anneal
Want to know more? Contact Expertech