Remanufactured Table Top Furnaces

For university or commercial product development, limited production, or R&D work large-scale batch furnaces are usually too costly in terms of budget, facilities requirements, and clean room space to be the best solution to your thermal processing or LPCVD system needs.

Expertech remanufactures these units with production in mind. Setup is easy and reduced power requirements enable most locations to add furnace capability without rewiring. The minibrutes are also available with a support cabinet, cantilever wafer loaders, and many other options.

The Minibrute furnaces support all atmospheric pressure and LPCVD processes. 

Model: MB71 Series MB80 Series MB81 Series
Substrate Sizes: 75mm 100mm 125mm
Temperature Range: 400-1200°C 400-1200°C 400-800°C
Furnace Flatzone(inches): 12" 12" 12"
Number of Tubes/stack: 1,2, or 3 1,2,or 3 1,2 or 3
Process Control System Options:

Analock/Sequencer

Analock/Sequencer Analock/Sequencer
   
Typical Atmospheric Processes Supported: Pyrogenic Oxidations (Internal/External Torch)
DI-H2O derived Oxidation
(special hi-saturation, auto-fill, long cycle)
Diffusion
Dopant Processes
(liquid and solid source)
Anneal
(inert and reducing atmosphere)
Typical LPCVD Processes Supported: Poly-Silicon (lo-temp, amorphous, hi-temp H2, and doped)
Silicon Nitride
(standard ratio and low-stress films)
LTO, PSG, BPSG
TEOS
Vacuum Anneal
Want to know more? Contact Expertech