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Remanufactured Table Top Furnaces |
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For university or commercial
product development, limited production, or R&D work large-scale batch
furnaces are usually too costly in terms of budget, facilities
requirements, and clean room space to be the best solution to your thermal
processing or LPCVD system needs. |
| Model: | MB71 Series | MB80 Series | MB81 Series | ![]() |
| Substrate Sizes: | 75mm | 100mm | 125mm | |
| Temperature Range: | 400-1200°C | 400-1200°C | 400-800°C | |
| Furnace Flatzone(inches): | 12" | 12" | 12" | |
| Number of Tubes/stack: | 1,2, or 3 | 1,2,or 3 | 1,2 or 3 | |
| Process Control System Options: |
Analock/Sequencer |
Analock/Sequencer | Analock/Sequencer | |
| Typical Atmospheric Processes Supported: | Pyrogenic
Oxidations (Internal/External Torch) DI-H2O derived Oxidation (special hi-saturation, auto-fill, long cycle) Diffusion Dopant Processes (liquid and solid source) Anneal (inert and reducing atmosphere) |
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| Typical LPCVD Processes Supported: | Poly-Silicon
(lo-temp, amorphous, hi-temp H2, and doped) Silicon Nitride (standard ratio and low-stress films) LTO, PSG, BPSG TEOS Vacuum Anneal |
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